Powder-type negative resist available: H-SiOx
Electron beam lithography equipment, EUV exposure equipment, nanoimprint lithography applications. Two types available: powder and solution!
AQM's H-SiOx is a negative-type resist available in both powder and solution forms. It offers performance comparable to Dow XR-154 and FOX. Each form has its own characteristics. 【Powder】 Long-term storage possible: Can be stored for up to one year, allowing for usage in small amounts over an extended period. Immediate availability: Can be obtained quickly when needed. Consistent viscosity: Does not thicken as it is mixed before use. Adjustable concentration: Can create a wide range of film thicknesses tailored to applications. Highest level of line width: Achieves a line width of 7nm. 【Liquid】 Available for purchase in small quantities: Can be tailored to the required amount. Short delivery time: Delivery can be made within one month after order. Made to order: Can be delivered with a longer shelf life. Highest level of line width: Achieves a line width of 7nm. For inquiries, please contact our representative, Kitano.
- Company：オプトシリウス
- Price：Other
